Special Equipment & Coating

Plasma and plant componentsProducts


Plasma CVD system for high-temperature silicon deposition

Upgrade to a ALD plasma electrode for the PEALD

Plasma line source with a hollow cathode structure

Two-chamber system for the combination PECVD/ CVD high temperature (1200°C) deposition

Hot Wire CVD chamber for silicon alloys



PECVD systems for solar-grade silicon

Etching for large - area Etching of metal structures

PECVD electrode for Large area deposition of amorphous silicon

Order and contract coating

On request, we can carry out sample or contract coatings according to your wishes with existing PECVD and plasma systems. For coating developments, we are open to your enquiries with our experienced personnel. Our laboratory is equipped for the use of hazardous gases.